Grantee Research Project Results
Journal Publications Details for Grant Number R831459
A New Approach for Reducing Global Warming Emissions from Etching by Controlling Ion Energy and Neutral Fluxes
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Reference Type | Citation | Progress Report Year | Document Sources |
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Journal Article | Lee D, Ting Y-H, Oksuz L, Hershkowitz N. Measurement of plasma potential fluctuations by emissive probes in CF4 radio-frequency plasma. Plasma Sources Science and Technology 2006;15(4):873–878 doi:10.1088/0963-0252/15/4/034. |
R831459 (Final) |
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Journal Article | Machima P, Hershkowitz N. SiO2 and Si3N4 etch mechanisms in NF3/hydrocarbon plasma. Journal of Physics D: Applied Physics 2006;39(4):673-684. |
R831459 (Final) |
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