Grantee Research Project Results
Publications Details for Grant Number R829554
Removal of Photoresist and Post-Plasma Etch Sidewall Films Using Superciritical and Subcritical CO2 with Additives
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| Reference Type | Reference Title | Journal | Author | Citation | Progress Report Year | Document Sources |
|---|---|---|---|---|---|---|
| Book Chapter | Fluorocarbon film and residue removal using supercrital CO2 mixtures. | None | Myneni S, Hess DW, Mendicino L | Myneni S, Hess DW, Mendicino L. Fluorocarbon film and residue removal using supercrital CO2 mixtures.. The Electrochemical Scoiety, Pennington, NJ. 2002:180-189 |
R829554 (2002) R829554 (Final) |
not available |
| Journal Article | Reactions between CO2 and tetramethylammonium hydroxide in cleaning solutions. | ELECTROCHEMICAL AND SOLID STATE LETTERS | Levitin G, Myneni S, Hess DW | Levitin G, Myneni S, Hess DW. Reactions between CO2 and tetramethylammonium hydroxide in cleaning solutions. Electrochemical and Solid State Letters 2003;6(8):G101-G104. |
R829554 (2002) R829554 (2003) R829554 (Final) |
not available |
| Journal Article | Phase behavior and modeling of CO2/methanol/tetramethylammonium bicarbonate and O2/methanol/tetramethylammonium bicarbonate/water mixtures at high pressures. | JOURNAL OF CHEMICAL ENGINEERING & DATA | Levitin G, Bush D, Eckert CA, Hess DW | Levitin G, Bush D, Eckert CA, Hess DW. Phase behavior and modeling of CO2/methanol/tetramethylammonium bicarbonate and O2/methanol/tetramethylammonium bicarbonate/water mixtures at high pressures. Journal of Chemical Engineering & Data 2004;49(3):599-606. |
R829554 (2003) R829554 (Final) |
not available |
| Journal Article | Post plasma etch residue removal using CO2-TMAHCO(3) mixtures: Comparison of single-phase and two-phase mixtures | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | Levitin G, Myneni S, Hess DW | Levitin G, Myneni S, Hess DW. Post plasma etch residue removal using CO2-TMAHCO(3) mixtures: Comparison of single-phase and two-phase mixtures. Journal of the Electrochemical Society 2004;151(6):G380-G386 |
R829554 (2002) R829554 (2003) R829554 (Final) |
not available |
| Journal Article | Ionic conductivity of elevated pressure TMAHCO(3)/MeOH/CO2 mixtures | ELECTROCHEMICAL AND SOLID STATE LETTERS | Levitin G, Hess DW | Levitin G, Hess DW. Ionic conductivity of elevated pressure TMAHCO(3)/MeOH/CO2 mixtures. Electrochemical and Solid State Letters 2005;8(1):G23-G26 |
R829554 (Final) |
not available |
| Journal Article | Post-plasma-etch residue removal using CO2-based fluids | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | Myneni S, Hess DW | Myneni S, Hess DW. Post-plasma-etch residue removal using CO2-based fluids. Journal of the Electrochemical Society 2003;150(12):G744-G750 |
R829554 (Final) |
not available |
| Journal Article | Compatibility of High Pressure Cleaning Mixtures with a Porous Low Dielectric Constant Film: A positronium Annihilation Lifetime Spectroscopic Study. | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | Myneni S, Peng H-G, Gidley DW, Hess DW | Myneni S, Peng H-G, Gidley DW, Hess DW. Compatibility of High Pressure Cleaning Mixtures with a Porous Low Dielectric Constant Film: A positronium Annihilation Lifetime Spectroscopic Study. Journal of Vacuum Science and Technology B 2005;.23(4): 1463. |
R829554 (Final) |
not available |
| Journal Article | Post plasma etch residue removal using CO2-based mixtures: Mechanistic considerations | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | Myneni S, Hess DW | Myneni S, Hess DW. Post plasma etch residue removal using CO2-based mixtures: Mechanistic considerations. Journal of the Electrochemical Society 2005;152(10) |
R829554 (Final) |
not available |
| Presentation | Carbon dioxide based fluids for post plasma etch residue removal in integrated circuit (IC) fabrication. | None | Hess DW, Levitin G, Myneni S | Hess DW, Levitin G, Myneni S. Carbon dioxide based fluids for post plasma etch residue removal in integrated circuit (IC) fabrication. Presented at the Seventh Annual Green Chemistry and Engineering Conference, Washington, DC, June 23-26, 2003. |
R829554 (Final) |
not available |
| Presentation | Impact of phase behavior on photoresist removal using CO2 based mixtures. | None | Levitin G, Myneni S, Hess DW | Levitin G, Myneni S, Hess DW. Impact of phase behavior on photoresist removal using CO2 based mixtures. Presented at the Eighth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 204th Meeting of The Electrochemical Society, Orlando, FL, October 12-16, 2003. |
R829554 (Final) |
not available |
| Presentation | Super- and sub-critical CO2-based cleaning in BEOL processing: correlations between physical properties of cleaning mixtures and removal mechanism. | None | Levitin G, Myneni S, Hess DW | Levitin G, Myneni S, Hess DW. Super- and sub-critical CO2-based cleaning in BEOL processing: correlations between physical properties of cleaning mixtures and removal mechanism. Presented at the SEMATECH Cleaning Workshop, Austin, TX, May 7, 2004. |
R829554 (Final) |
not available |
| Presentation | Fluorocarbon film and residue removal using supercritical CO2 mixtures. | None | Myneni S, Hess DW | Myneni S, Hess DW. Fluorocarbon film and residue removal using supercritical CO2 mixtures. Presented at the 5th International Symposium on Environmental Issues with Materials and Processes for the Electronic and Semiconductors Industries, 201st Meeting of The Electrochemical Society, Philadelphia, PA, May 12-17, 2002. |
R829554 (2002) |
not available |
| Proceedings | Impact of phase behavior on photoresist removal using CO2 based mixtures. | None | Levitin G, Myneni S, Hess DW | Levitin G, Myneni S, Hess DW. Impact of phase behavior on photoresist removal using CO2 based mixtures. In: Ruzyllo J, Hattori T, Novak R, Opila R, eds. Cleaning Technology in Semiconductor Device Manufacturing, PV 2003-26, The Electrochemical Society Proceedings Series, Orlando, FL, October 12-17, 2003. |
R829554 (2003) R829554 (Final) |
not available |
| Proceedings | Fluorocarbon film and residue removal using supercritical CO2 mixtures. | None | Myneni S, Hess DW | Myneni S, Hess DW. Fluorocarbon film and residue removal using supercritical CO2 mixtures. Proceedings - Electrochemical Society 2002;15:180-189. |
R829554 (Final) |
not available |
The perspectives, information and conclusions conveyed in research project abstracts, progress reports, final reports, journal abstracts and journal publications convey the viewpoints of the principal investigator and may not represent the views and policies of ORD and EPA. Conclusions drawn by the principal investigators have not been reviewed by the Agency.