Grantee Research Project Results
Publications submitted after final report Details for Grant Number R829554
Removal of Photoresist and Post-Plasma Etch Sidewall Films Using Superciritical and Subcritical CO2 with Additives
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Reference Type | Citation | Progress Report Year (Date Added to Report) | Document Sources |
---|---|---|---|
Book Chapter | Myneni S, Hess DW, Mendicino L. Fluorocarbon film and residue removal using supercrital CO2 mixtures.. The Electrochemical Scoiety, Pennington, NJ. 2002:180-189 |
R829554 (Final) (01/14/10) |
not available |
Journal Article | Levitin G, Myneni S, Hess DW. Reactions between CO2 and tetramethylammonium hydroxide in cleaning solutions. Electrochemical and Solid State Letters 2003;6(8):G101-G104. |
R829554 (Final) (01/14/10) |
not available |
Journal Article | Levitin G, Bush D, Eckert CA, Hess DW. Phase behavior and modeling of CO2/methanol/tetramethylammonium bicarbonate and O2/methanol/tetramethylammonium bicarbonate/water mixtures at high pressures. Journal of Chemical Engineering & Data 2004;49(3):599-606. |
R829554 (Final) (01/14/10) |
not available |
Journal Article | Myneni S, Hess DW. Post plasma etch residue removal using CO2-based mixtures: Mechanistic considerations. Journal of the Electrochemical Society 2005;152(10) |
R829554 (Final) (01/14/10) |
not available |
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