Grantee Research Project Results
Book and Book Chapter Publications Details for Grant Number R829554
Removal of Photoresist and Post-Plasma Etch Sidewall Films Using Superciritical and Subcritical CO2 with Additives
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Reference Type | Citation | Progress Report Year | Document Sources |
---|---|---|---|
Book Chapter | Myneni S, Hess DW, Mendicino L. Fluorocarbon film and residue removal using supercrital CO2 mixtures.. The Electrochemical Scoiety, Pennington, NJ. 2002:180-189 |
R829554 (2002) R829554 (Final) |
not available |
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