Grantee Research Project Results
Publications submitted after final report Details for Grant Number R829586
Dry Lithography: Environmentally Responsible Processes for High Resolution Pattern Transfer and Elimination of Image Collapse using Positive Tone Resists
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| Reference Type | Citation | Progress Report Year (Date Added to Report) | Document Sources |
|---|---|---|---|
| Abstract | Boggiano MK, DeSimone J. Alicyclic photoresists for CO2-based microlithography at 157 nm. Abstracts of Papers of the American Chemical Society 2002;224(Pt 2):149-PMSE. |
R829586 (Final) (01/04/07) |
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| Abstract | Boggiano MK, DeSimone JM. Photoresists for CO2-based next-generation microlithography. Abstracts of Papers of the American Chemical Society 2005;229(Pt 2):83-PMSE. |
R829586 (Final) (01/04/07) |
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| Abstract | Denison GM, Jones CA, DeYoung J, Gross SM, McClain J, Zannoni LA, Hicks E, Wood CD, Boggiano MK, Visintin PM, Bessel CA, Schauer CK, DeSimone JM. Use of "dry" CO2-based technologies for the enhanced fabrication of microelectronic devices. Abstracts of Papers of the American Chemical Society 2004;227(Pt 2):89-PMSE. |
R829586 (Final) (01/04/07) |
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| Patent/Patent Application | DeSimone JM, Denison Rothrock G. Isolated and fixed micro and nano structures and methods thereof. U.S. Patent Application No. 20070264481 A1, November 15, 2007. |
R826115 (Final) (08/10/10) R829586 (Final) (08/10/10) |
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| Patent/Patent Application | DeSimone JM, Rothrock GD. Micro-and nano-structure metrology. U.S. Patent Application No. 20090304992 A1, December 10, 2009. |
R826115 (Final) (08/10/10) R829586 (Final) (08/10/10) |
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| Patent/Patent Application | DeSimone JM, Rolland JP, Maynor BW, Euliss LE, Rothrock GD, Dennis A, Samulski ET, Samulski RJ. Methods for fabricating isolated micro- and nano-structures using soft or imprint lithography. U.S. Patent Application No. 20090061152 A1, March 5, 2009. |
R826115 (Final) (08/10/10) R829586 (Final) (08/10/10) |
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| Patent/Patent Application | DeSimone JM, Siripurapu S, Khan SA, Spontak RJ, Royer J. Thin film of closed-cell foam. U.S. Patent No. 7,658,989 B2, February 9, 2010. |
R826115 (Final) (08/10/10) R829586 (Final) (08/10/10) |
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| Patent/Patent Application | DeSimone JM, Rothrock GD, Zhou Z, Samulski ET, Hampton M, Williams S. High fidelity nano-structures and arrays for photovoltaics and methods of making the same. U.S. Patent Application No. 20100147365 A1, June 17, 2010. |
R826115 (Final) (08/10/10) R829586 (Final) (08/10/10) |
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| Patent/Patent Application | DeSimone JM, Rolland JP, Maynor BW, Euliss LE, Rothrock GD, Dennis AE, Samulski ET, Samulski RJ. Methods for fabrication isolated micro- and nano-structures using soft or imprint lithography. U.S. Patent No. 8,420,124, April 16, 2013. |
R826115 (Final) (08/10/10) R829586 (Final) (08/10/10) |
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The perspectives, information and conclusions conveyed in research project abstracts, progress reports, final reports, journal abstracts and journal publications convey the viewpoints of the principal investigator and may not represent the views and policies of ORD and EPA. Conclusions drawn by the principal investigators have not been reviewed by the Agency.