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Impact of enhanced ozone deposition and halogen chemistry on model performance
Citation:
Sarwar, G., B. Gantt, D. Schwede, David-C Wong, R. Mathur, AND A. Saiz-Lopez. Impact of enhanced ozone deposition and halogen chemistry on model performance. 13th Annual CMAS Conference, Chapel Hill, NC, October 27 - 29, 2014.
Impact/Purpose:
The National Exposure Research Laboratory (NERL) Atmospheric Modeling and Analysis Division (AMAD) conducts research in support of EPA mission to protect human health and the environment. AMAD research program is engaged in developing and evaluating predictive atmospheric models on all spatial and temporal scales for forecasting the air quality and for assessing changes in air quality and air pollutant exposures, as affected by changes in ecosystem management and regulatory decisions. AMAD is responsible for providing a sound scientific and technical basis for regulatory policies based on air quality models to improve ambient air quality. The models developed by AMAD are being used by EPA, NOAA, and the air pollution community in understanding and forecasting not only the magnitude of the air pollution problem, but also in developing emission control policies and regulations for air quality improvements.
Description:
In this study, an enhanced ozone deposition scheme due to the interaction of iodide in sea-water and atmospheric ozone and the detailed chemical reactions of organic and inorganic halogen species are incorporated into the hemispheric Community Multiscale Air Quality model. Preliminary results suggest both the enhanced ozone deposition and the halogen chemistry reduce ozone over marine environments. Halogen chemistry reduces monthly-mean surface ozone by 4.0-6.0 ppbv over large areas of marine environments while enhanced deposition reduces ozone by 1.0-2.0 ppbv. The halogen chemistry reduces more ozone than the enhanced deposition scheme. Model predictions with these processes improve the comparison with observed ozone data at remote locations. Enhanced ozone deposition and the halogen chemistry are two important atmospheric processes and improve model performance.
