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ENVIRONMENTAL TECHNOLOGY INITIATIVE: CHEMICAL-FREE CLEANING OF SEMICONDUCTORS BY THE RADIANCE PROCESS
Legge, R. N., D. L. Thompson, D. J. Convey, AND J. D. Peterson. ENVIRONMENTAL TECHNOLOGY INITIATIVE: CHEMICAL-FREE CLEANING OF SEMICONDUCTORS BY THE RADIANCE PROCESS. U.S. Environmental Protection Agency, Washington, D.C., EPA/600/R-98/153 (NTIS PB99-126518), 1998.
The Radiance Process is a patented dry process for removing contaminants from surfaces. It uses light, usually from a pulsed laser and a gas inert to the surface, to entrain released contaminants. The focus of this effort is to assess the applicability of the Radiance Process to the semiconductor industry and its pollution prevention potential.