Main Title |
Chemical vapor deposition in the silicon-carbon and boron-carbon-nitrogen systems |
Author |
Besmann, Theodore M.
|
Publisher |
Oak Ridge National Laboratory ; |
Year Published |
1988 |
OCLC Number |
24455677 |
Subjects |
Energy conservation--Chemical industry
|
Holdings |
Library |
Call Number |
Additional Info |
Location |
Last Modified |
Checkout Status |
EJBM |
TJ163.5.C54B47 |
|
Headquarters Library/Washington,DC |
10/05/1991 |
|
Collation |
vii, 26 p. |
Notes |
Head of title: Metals and ceramics division. "ORNL/TM-10884." "Contract no. DE-AC05-84OR21400"--T.p. "November 1988"--T.p. |
Place Published |
Oak Ridge, Tenn. : |
Corporate Au Added Ent |
Oak Ridge National Laboratory. ; Oak Ridge National Laboratory. |
PUB Date Free Form |
1988. |
BIB Level |
m |
Cataloging Source |
OCLC/T |
OCLC Time Stamp |
19910926082438 |
Language |
ENG |
Origin |
OCLC |
Type |
CAT |
OCLC Rec Leader |
00949nam 2200217Ka 45020 |