| Main Title |
Chemical vapor deposition in the silicon-carbon and boron-carbon-nitrogen systems |
| Author |
Besmann, Theodore M.
|
| Publisher |
Oak Ridge National Laboratory ; |
| Year Published |
1988 |
| OCLC Number |
24455677 |
| Subjects |
Energy conservation--Chemical industry
|
| Holdings |
| Library |
Call Number |
Additional Info |
Location |
Last
Modified |
Checkout
Status |
| EJBM |
TJ163.5.C54B47 |
|
Headquarters Library/Washington,DC |
10/05/1991 |
|
| Collation |
vii, 26 p. |
| Notes |
Head of title: Metals and ceramics division. "ORNL/TM-10884." "Contract no. DE-AC05-84OR21400"--T.p. "November 1988"--T.p. |
| Place Published |
Oak Ridge, Tenn. : |
| Corporate Au Added Ent |
Oak Ridge National Laboratory. ; Oak Ridge National Laboratory. |
| PUB Date Free Form |
1988. |
| BIB Level |
m |
| Cataloging Source |
OCLC/T |
| OCLC Time Stamp |
19910926082438 |
| Language |
ENG |
| Origin |
OCLC |
| Type |
CAT |
| OCLC Rec Leader |
00949nam 2200217Ka 45020 |
