Record Display for the EPA National Library Catalog
RECORD NUMBER: 6 OF 8| Main Title | Photopolymers : photoresist materials, processes, and applications / | ||||
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| Type | EBOOK | ||||
| Author | Nakamura, Kenichiro | ||||
| Publisher | CRC Press, | ||||
| Year Published | 2015 | ||||
| Call Number | TA455.P58N35 2015 | ||||
| ISBN | 9781466517318 (e-book : PDF); 9781466517288 (hardback) | ||||
| Subjects | Photopolymers ; Photoresists ; Photopolymerization ; Photopolymers--Industrial applications ; Microelectronics--Materials | ||||
| Internet Access |
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| Collation | 1 online resource : text file, PDF. | ||||
| Notes | Includes bibliographical references and index. Due to license restrictions, this resource is available to EPA employees and authorized contractors only |
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| Contents Notes | 1. Basic idea of photopolymerization -- 2. Chemically amplified resists -- 3. Process of chemically amplified resists -- 4. Nanoimprint -- 5. Industrial application of photopolymers. "Advancements in photopolymers have led to groundbreaking achievements in electronic, optical, and medical engineering. At present, photopolymers have myriad applications in semiconductor device manufacturing, printed circuit boards (PCBs), ultraviolet (UV) curing, microelectromechanical systems (MEMS), and medical materials. Addressing topics such as chemically amplified resists, immersion lithography, extreme ultraviolet (EUV) lithography, and nanoimprinting, this book covers photopolymers from core concepts to industrial applications, providing the chemical formulae and structures of the materials discussed as well as practical case studies from some of the world's largest corporations"-- |