| Contents Notes |
Analytical approaches and expert systems in the characterization of microelectronic devices / D.E. Passoja, Lawrence A. Casper, and A.J. Scharman -- Electrical characterization of semiconductor materials and devices / Dieter K. Schroder -- Dopant profiles by the spreading resistance technique / Robert G. Mazur -- Scanning electron microscopic techniques for characterization of semiconductor materials / Rodney A. Young and Ronald V. Kalin -- Semiconductor materials defect diagnostics for submicrometer very large scale integration technology / G.A. Rozgonyi and D.K. Sadana -- Applications of secondary ion mass spectroscopy to characterization of microelectronic materials / Mary Ryan-Hotchkiss -- Applications of Auger electron spectroscopy in microelectronics / Paul A. Lindfors, Ronald W. Kee, and Douglas L. Jones -- X-ray photoelectron spectroscopy applied to microelectronic materials / William F. Stickle and Kenneth D. Bomben -- Application of neutron depth profiling to microelectronic materials processing / R.G. Downing, J.T. Maki, and R.F. Fleming -- Thermal-wave measurement of thin-film thickness / Allan Rosencwaig -- Characterization of materials, thin films, and interfaces by optical reflectance and ellipsometric techniques / D.E. Aspnes -- Measurement of the oxygen and carbon content of silicon wafers by Fourier transform IR spectrophotometry / Aslan Baghdadi -- Application of the Raman microprobe to analytical problems of microelectronics / Fran Adar -- Characterization of gallium arsenide by magneto-optical photoluminescent spectroscopy / D.C. Reynolds -- Thermal-wave imaging in a scanning electron microscope / Allan Rosencwaig -- Fourier transform mass spectrometry in the microelectronics service laboratory / W.H. Penzel -- Materials characterization using elemental and isotopic analyses by inductively coupled plasma mass spectrometry / B. Shushan, E.S.K. Quan, A. Boorn, D.J. Douglas, and G. Rosenblatt -- Activation analysis of electronics materials / Richard M. Lindstrom -- Trace element survey analyses by spark source mass spectrography / Fredric D. Leipziger and Richard J. Guidoboni -- Characterization of components in plasma phosphorus-doped oxides / Jana Houskova, Kim-Khanh N. Ho, and Marjorie K. Balazs -- Process control of vacuum-deposited nickel-chromium for the fabrication of reproducible thin-film resistors / Vineet S. Dharmadhikari -- Characterization of spin-on glass films as a planarizing dielectric / Satish K. Gupta and Roland L. Chin -- Effects of various chemistries on silicon-wafer cleaning / D. Scott Becker, William R. Schmidt, Charlie A. Peterson, and Don C. Burkman -- Monitoring of particles in gases with a laser counter / C.E. Nowakowski and J.V. Martinez de Pinillos -- Microelectronics processing problem solving : the synergism of complementary techniques / J.N. Ramsey. |
