Record Display for the EPA National Library Catalog

RECORD NUMBER: 6 OF 16

Main Title In situ treatment technology /
Other Authors
Author Title of a Work
Nyer, Evan K.
Publisher Lewis Publishers,
Year Published 1996
OCLC Number 33665883
ISBN 0873719956; 9780873719957
Subjects In situ remediation ; Bodensanierung
Holdings
Library Call Number Additional Info Location Last
Modified
Checkout
Status
EHAM  TD192.8.I5724 1996 Region 1 Library/Boston,MA 02/14/1998
EIAM  TD192.8.I5724 1996 Region 2 Library/New York,NY 10/15/2004
EKCM  TD192.8.I5724 1996 CEMM/GEMMD Library/Gulf Breeze,FL 06/23/2021
EMAM  TD192.8.I575 1996 Region 6 Library/Dallas,TX 02/10/2009
EMBM  TD192.8.I5724 1996 NRMRL/GWERD Library/Ada,OK 03/28/1998
Collation 329 pages : illustrations ; 25 cm.
Notes
Includes bibliographical references and index.
Contents Notes
1. Limitations of Pump-and-Treat Remediation Methods / Evan K. Nyer -- 2. Life Cycle Design / Evan K. Nyer -- 3. In Situ Bioremediation / Evan K. Nyer, Tom L. Crossman and Gary Boettcher -- 4. Vapor Extraction and Bioventing / Sami Fam -- 5. Vacuum-Enhanced Recovery / Peter L. Palmer -- 6. In Situ Air Sparging / Suthan S. Suthersan -- 7. Air Treatment for In Situ Technologies / Sami Fam -- 8. Fracturing / Donald F. Kidd -- 9. Reactive Walls / Peter L. Palmer -- 10. Miscellaneous In Situ Treatment Technologies / Frank J. Johns II and Evan K. Nyer. "The most exciting technical area in the remediation field today is "in place" or in situ technologies. This book, in the popular Geraghty & Miller series, provides a single reference source on the various available in situ technologies. Each of the primary areas is covered in a separate chapter, allowing for in-depth reviews, including laboratory and pilot plant studies, full-scale design, operation and maintenance, cost analysis, and case histories. Emerging technologies are summarized (including phytoremediation, temperature-enhanced extraction, reactive zones, and others). One of the unique features of this book is its excellent coverage of the geologic foundation and limitations of each of the technologies."--Jacket.