TY  - JOUR
A1  - Jafri, I 
A1  - Busta, H 
A1  - Walsh, S 
T1  - Critical Point Drying and Cleaning for MEMS Technology.
Y1  - 1999/09/
N1  - 68D99050
JF  - MICROMACHINING AND MICROFABRICATION
VL  - 3880
ER  - 


TY  - Symposium
A1  - H., M 
A1  - I., J 
A1  - D., M 
A1  - R., H .
T1  - Photoresist Stripping with CO2-Based Supercritical Fluids.
N1  - 68D99050
ER  - 


TY  - Symposium
A1  - I., J 
A1  - H., B 
A1  - J., R 
A1  - J., B 
T1  - Applications of Supercritical Carbon Dioxide for Semiconductor and MEMS Processing.
N1  - 68D99050
ER  -