Publications submitted after final report Details for:

Dry Lithography: Environmentally Responsible Processes for High Resolution Pattern Transfer and Elimination of Image Collapse using Positive Tone Resists
Grant Number R829586
RFA: Technology for a Sustainable Environment (2001)
Abstract (3)
Patent/Patent Application (6)
Reference Type Reference Title Journal Author Citation Progress Report Year (Date Added to Report) Document Sources
Abstract Alicyclic photoresists for CO2-based microlithography at 157 nm. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY Boggiano MK, DeSimone J Boggiano MK, DeSimone J. Alicyclic photoresists for CO2-based microlithography at 157 nm. Abstracts of Papers of the American Chemical Society 2002;224(Pt 2):149-PMSE. R829586 (Final) (01/04/07)
Abstract Photoresists for CO2-based next-generation microlithography. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY Boggiano MK, DeSimone JM Boggiano MK, DeSimone JM. Photoresists for CO2-based next-generation microlithography. Abstracts of Papers of the American Chemical Society 2005;229(Pt 2):83-PMSE. R829586 (Final) (01/04/07)
Abstract Use of "dry" CO2-based technologies for the enhanced fabrication of microelectronic devices. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY Denison GM, Jones CA, DeYoung J, Gross SM, McClain J, Zannoni LA, Hicks E, Wood CD, Boggiano MK, Visintin PM, Bessel CA, Schauer CK, DeSimone JM Denison GM, Jones CA, DeYoung J, Gross SM, McClain J, Zannoni LA, Hicks E, Wood CD, Boggiano MK, Visintin PM, Bessel CA, Schauer CK, DeSimone JM. Use of "dry" CO2-based technologies for the enhanced fabrication of microelectronic devices. Abstracts of Papers of the American Chemical Society 2004;227(Pt 2):89-PMSE. R829586 (Final) (01/04/07)
Patent/Patent Application Isolated and fixed micro and nano structures and methods thereof. None DeSimone JM, Denison Rothrock G DeSimone JM, Denison Rothrock G. Isolated and fixed micro and nano structures and methods thereof. U.S. Patent Application No. 20070264481 A1, November 15, 2007. R826115 (Final) (08/10/10)
R829586 (Final) (08/10/10)
Patent/Patent Application Micro- and nano-structure metrology. None DeSimone JM, Rothrock GD DeSimone JM, Rothrock GD. Micro-and nano-structure metrology. U.S. Patent Application No. 20090304992 A1, December 10, 2009. R826115 (Final) (08/10/10)
R829586 (Final) (08/10/10)
Patent/Patent Application Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography None DeSimone JM, Rolland JP, Maynor BW, Euliss LE, Rothrock GD, Dennis A, Samulski ET, Samulski RJ DeSimone JM, Rolland JP, Maynor BW, Euliss LE, Rothrock GD, Dennis A, Samulski ET, Samulski RJ. Methods for fabricating isolated micro- and nano-structures using soft or imprint lithography. U.S. Patent Application No. 20090061152 A1, March 5, 2009. R826115 (Final) (08/10/10)
R829586 (Final) (08/10/10)
Patent/Patent Application Thin film of closed-cell foam. None DeSimone JM, Siripurapu S, Khan SA, Spontak RJ, Royer J DeSimone JM, Siripurapu S, Khan SA, Spontak RJ, Royer J. Thin film of closed-cell foam. U.S. Patent No. 7,658,989 B2, February 9, 2010. R826115 (Final) (08/10/10)
R829586 (Final) (08/10/10)
Patent/Patent Application High fidelity nano-structures and arrays for photovoltaics and methods of making the same. None DeSimone JM, Rothrock GD, Zhou Z, Samulski ET, Hampton M, Williams S DeSimone JM, Rothrock GD, Zhou Z, Samulski ET, Hampton M, Williams S. High fidelity nano-structures and arrays for photovoltaics and methods of making the same. U.S. Patent Application No. 20100147365 A1, June 17, 2010. R826115 (Final) (08/10/10)
R829586 (Final) (08/10/10)
Patent/Patent Application Methods for fabrication isolated micro- and nano-structures using soft or imprint lithography. None DeSimone JM, Rolland JP, Maynor BW, Euliss LE, Rothrock GD, Dennis AE, Samulski ET, Samulski RJ. DeSimone JM, Rolland JP, Maynor BW, Euliss LE, Rothrock GD, Dennis AE, Samulski ET, Samulski RJ. Methods for fabrication isolated micro- and nano-structures using soft or imprint lithography. U.S. Patent No. 8,420,124, April 16, 2013. R826115 (Final) (08/10/10)
R829586 (Final) (08/10/10)