TY  - CONF
A1  - Boyd, S 
A1  - Dornfeld, D 
A1  - Krishnan, N 
A1  - Moalem, M 
T1  - Environmental challenges for 45-nm and 32-nm node CMOS logic.
Y1  - 2007//
N1  - R831456
ER  - 


TY  - CONF
A1  - Yuan, C 
T1  - A decision-based analysis of compressed air usage patterns in automotive manufacturing.
Y1  - 2005//
N1  - R831456
ER  - 


TY  - CONF
A1  - Zhang, T W
A1  - Bates, S W
A1  - Dornfeld, D A
T1  - Operational energy use of plasmonic imaging lithography.
Y1  - 2007//
N1  - R831456
ER  - 


TY  - CONF
A1  - Zhang, T 
A1  - Boyd, S 
A1  - Vijayaraghavan, A 
A1  - Dornfeld, D 
T1  - Energy use in nanoscale manufacturing.
Y1  - 2006//
N1  - R831456
ER  - 


TY  - CONF
A1  - Zhang, T 
A1  - Dornfeld, D 
T1  - Energy use per worker-hour: evaluating the contribution of labor to manufacturing energy use.
Y1  - 2007//
N1  - R831456
ER  - 


TY  - CONF
A1  - Boyd, S 
A1  - Dornfield, D 
A1  - Krishnan, N 
T1  - Life cycle inventory of a CMOS chip
Y1  - 2006/07/05
N1  - R831456
JF  - PROCEEDINGS OF THE 2006 IEEE INTERNATIONAL SYMPOSIUM ON ELECTRONICS & THE ENVIRONMENT, CONFERENCE RECORD
SP  - 253
ER  - 


TY  - CONF
A1  - Boyd, S 
A1  - Dornfeld,   D
A1  - Krishnan, N 
T1  - Life cycle inventory of a CMOS chip.
Y1  - 2006//
N1  - R831456
ER  - 


TY  - CONF
A1  - Boyd, S 
A1  - Dornfeld, D 
A1  - Krishnan, N 
A1  - Moalem, M 
T1  - Environmental challenges for 45-nm and 32-nm node CMOS logic.
Y1  - 2007//
N1  - R831456
ER  - 


TY  - CONF
A1  - Zhang, T W
A1  - Boyd, S 
A1  - Vijayaraghavan, A 
A1  - Dornfeld, D 
T1  - Energy use in nanoscale manufacturing.
Y1  - 2006//
N1  - R831456
ER  - 


TY  - CONF
A1  - Zhang, T W
A1  - Dornfeld, D A
T1  - Energy use per worker-hour: evaluating the contribution of labor to manufacturing energy use.
Y1  - 2007/09/
N1  - R831456
SP  - 189
EP  - 193
ER  - 


TY  - CONF
A1  - Zhang, T W
A1  - Bates, S W
A1  - Dornfeld, D A
T1  - Operational energy analysis of plasmonic imaging lithography.
Y1  - 2007//
N1  - R831456
ER  - 


TY  - CONF
A1  - Zhang, T 
A1  - Bates, S 
A1  - Dornfield, D 
T1  - Operational energy analysis of plasmonic imaging lithography
Y1  - 2007/06/04
N1  - R831456
JF  - PROCEEDINGS OF THE 2007 IEEE INTERNATIONAL SYMPOSIUM ON ELECTRONICS & THE ENVIRONMENT, CONFERENCE RECORD
SP  - 97
ER  -