TY  - Abstract
A1  - Boggiano, M K
A1  - DeSimone, J M
T1  - Alicyclic photoresists for CO<sub>2</sub>-based microlithography at 157 nm.
Y1  - 2002//
N1  - R829586
JF  - ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY
J1  - ABSTR PAP AM CHEM S
VL  - 224
IS  - Pt 2
SP  - 149
EP  - PMSE
ER  - 


TY  - Abstract
A1  - Boggiano, M K
A1  - DeSimone, J 
T1  - Alicyclic photoresists for CO<sub>2</sub>-based microlithography at 157 nm.
Y1  - 2002//
N1  - R829586
JF  - POLYMERIC MATERIALS SCIENCE AND ENGINEERING
VL  - 87
SP  - 207
EP  - 208
ER  - 


TY  - Abstract
A1  - Boggiano, M K
A1  - DeSimone, J M
T1  - Photoresists for CO<sub>2</sub>-based next-generation microlithography.
Y1  - 2005//
N1  - R829586
JF  - POLYMERIC MATERIALS SCIENCE AND ENGINEERING
VL  - 92
SP  - 140
EP  - 141
ER  - 


TY  - Abstract
A1  - Boggiano, M K
A1  - DeSimone, J M
T1  - Photoresists for CO<sub>2</sub>-based next-generation microlithography.
Y1  - 2005//
N1  - R829586
JF  - ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY
J1  - ABSTR PAP AM CHEM S
VL  - 229
IS  - Pt 2
SP  - 83
EP  - PMSE
ER  - 


TY  - Abstract
A1  - Denison, G M
A1  - Jones, C A
A1  - DeYoung, J 
A1  - Gross, S M
A1  - McClain, J 
A1  - Zannoni, L A
A1  - Hicks, E 
A1  - Wood, C D
A1  - Boggiano, M K
A1  - Visintin, P M
A1  - Bessel, C A
A1  - Schauer, C K
A1  - DeSimone, J M
T1  - Use of "dry" CO<sub>2</sub>-based technologies for the enhanced fabrication of microelectronic devices.
Y1  - 2004//
N1  - R829586
JF  - POLYMERIC MATERIALS SCIENCE AND ENGINEERING
VL  - 90
SP  - 152
EP  - 153
ER  - 


TY  - Abstract
A1  - Denison, G M
A1  - Jones, C A
A1  - DeYoung, J 
A1  - Gross, S. M
A1  - McClain, J 
A1  - Zannoni, L A
A1  - Hicks, E 
A1  - Wood, C D
A1  - Boggiano, M K
A1  - Visintin, P M
A1  - Bessel, C A
A1  - Schauer, C K
A1  - DeSimone, J M
T1  - Use of "dry" CO<sub>2</sub>-based technologies for the enhanced fabrication of microelectronic devices.
Y1  - 2004//
N1  - R829586
JF  - ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY
J1  - ABSTR PAP AM CHEM S
VL  - 227
IS  - Pt 2
SP  - 89
EP  - PMSE
ER  - 


TY  - Abstract
A1  - Maynor, B W
A1  - Rolland, J P
A1  - Exner, A E
A1  - DeSimone, J M
T1  - Rational fabrication of polymeric nanostructures using soft lithography.
Y1  - 2005//
N1  - R829586
JF  - POLYMER PREPRINTS
VL  - 46
SP  - 82
ER  - 


TY  - Abstract
A1  - Wood, C D
A1  - DeSimone, J M
T1  - New fluoropolymers for next generation photolithographic techniques.
Y1  - 2005//
N1  - R829586
JF  - POLYMERIC MATERIALS SCIENCE AND ENGINEERING
VL  - 92
SP  - 133
ER  - 


TY  - Abstract
A1  - Zannoni, L A
A1  - DeSimone, J M
T1  - Synthesis, characterization, and properties of copolymers prepared in dense carbon dioxide towards the development of a 157 nm photoresist.
Y1  - 2002//
N1  - R829586
JF  - POLYMERIC MATERIALS SCIENCE AND ENGINEERING PREPRINTS
VL  - 87
SP  - 197
EP  - 198
ER  - 


TY  - CONF
A1  - Boggiano, M K
A1  - DeSimone, J M
T1  - Alicyclic photoresists for CO<sub>2</sub>-based microlithography at 157 nm.
Y1  - 2003/02/23
N1  - R829586
VL  - 5039
SP  - 650
EP  - 654
ER  - 


TY  - CONF
A1  - Boggiano, M K
A1  - DeSimone, J M
T1  - Synthesis of photoresists for 157 nm microlithography using CO<sub>2</sub>.
Y1  - 2004/02/22
N1  - R829586
VL  - 5376
SP  - 549
EP  - 553
ER  - 


TY  - CONF
A1  - Boggiano, M K
A1  - Wood, C D
A1  - DeSimone, J M
T1  - Photoresists for CO2-based next-generation microlithography.
Y1  - 2005/02/27-4
N1  - R829586
SP  - 487
EP  - 490
ER  - 


TY  - PAT
A1  - DeSimone, J M
A1  - Denison Rothrock, G 
T1  - Isolated and fixed micro and nano structures and methods thereof.
Y1  - 2007/11/15
N1  - R829586
N1  - R826115
ER  - 


TY  - PAT
A1  - DeSimone, J M
A1  - Rothrock, G D
T1  - Micro- and nano-structure metrology.
Y1  - 2009/12/10
N1  - R829586
N1  - R826115
ER  - 


TY  - PAT
A1  - DeSimone, J M
A1  - Rolland, J P
A1  - Maynor, B W
A1  - Euliss, L E
A1  - Rothrock, G D
A1  - Dennis, A 
A1  - Samulski, E T
A1  - Samulski, R J
T1  - Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography
Y1  - 2009/03/5
N1  - R829586
N1  - R826115
ER  - 


TY  - PAT
A1  - DeSimone, J M
A1  - Siripurapu, S 
A1  - Khan, S A
A1  - Spontak, R J
A1  - Royer, J 
T1  - Thin film of closed-cell foam.
Y1  - 2010/02/9
N1  - R829586
N1  - R826115
ER  - 


TY  - PAT
A1  - DeSimone, J M
A1  - Rothrock, G D
A1  - Zhou, Z 
A1  - Samulski, E T
A1  - Hampton, M 
A1  - Williams, S 
T1  - High fidelity nano-structures and arrays for photovoltaics and methods of making the same.
Y1  - 2010/06/17
N1  - R829586
N1  - R826115
ER  - 


TY  - PAT
A1  - DeSimone, J M
A1  - Rolland, J P
A1  - Maynor, B W
A1  - Euliss, L E
A1  - Rothrock, G D
A1  - Dennis, A E
A1  - Samulski, E T
A1  - Samulski, R 
T1  - Methods for fabrication isolated micro- and nano-structures using soft or imprint lithography.
Y1  - 2013/04/16
N1  - R829586
N1  - R826115
ER  - 


TY  - CONF
A1  - Zannoni, L A
A1  - DeSimone, J M
T1  - Development of a 157 nm photoresist for CO2 based lithography.
N1  - R829586
ER  - 


TY  - CONF
A1  - Zannoni, L A
A1  - DeSimone, J M
T1  - Progress towards the development of a 157 nm photoresist for carbon dioxide based lithography.
N1  - R829586
ER  - 


TY  - CONF
A1  - Zannoni, L A
A1  - DeSimone, J M
T1  - Synthesis, characterization, and properties of copolymers prepared in dense carbon dioxide towards the development of a 157 nm Photoresist.
N1  - R829586
ER  - 


TY  - CONF
A1  - Zannoni, L A
A1  - Simhan, J 
A1  - DeSimone, J M
T1  - Progress towards the development of a 157 nm photoresist for carbon dioxide based lithography.
N1  - R829586
ER  -