Nucleation Kinetics of High-k Dielectric Film Deposition Using Atomic-Layer DepositionEPA Grant Number: U915772
Title: Nucleation Kinetics of High-k Dielectric Film Deposition Using Atomic-Layer Deposition
Investigators: Kiehlbaugh, Kasi M.
Institution: University of Arizona
EPA Project Officer: Packard, Benjamin H
Project Period: September 1, 2000 through September 1, 2003
Project Amount: $92,736
RFA: STAR Graduate Fellowships (2000) RFA Text | Recipients Lists
Research Category: Academic Fellowships , Engineering and Environmental Chemistry , Fellowship - Engineering
This research project will explore the surface nucleation kinetics of high-k dielectric film deposition. This will be accomplished by identifying and testing potential precursor reactant sequences for the atomic layer deposition of various films.
An ultra-high vacuum reactor is being designed that will decouple mass transport from the surface reactions to facilitate an in-depth investigation of the surface kinetics. The reaction chamber will be equipped with in-situ Fourier Transform Infra Red (FTIR) and Temperature-Programmed Reaction Spectroscopy (TPRS) capabilities. To allow vacuum transfer of samples, the reactor will be clustered together with an existing integrated processing tool that contains two gas-phase cleaning reactor modules and a surface analysis chamber that is equipped with X-ray Photoelectron Spectroscopy (XPS) and Auger Spectroscopy.
This research is expected to yield information about the reaction pathways, the effect of coverage on the kinetic parameters and the mechanism, and values for activation energies and pre-exponential factors.