Nucleation Kinetics of High-k Dielectric Film Deposition Using Atomic-Layer Deposition

EPA Grant Number: U915772
Title: Nucleation Kinetics of High-k Dielectric Film Deposition Using Atomic-Layer Deposition
Investigators: Kiehlbaugh, Kasi M.
Institution: University of Arizona
EPA Project Officer: Packard, Benjamin H
Project Period: September 1, 2000 through September 1, 2003
Project Amount: $92,736
RFA: STAR Graduate Fellowships (2000) RFA Text |  Recipients Lists
Research Category: Academic Fellowships , Engineering and Environmental Chemistry , Fellowship - Engineering


This research project will explore the surface nucleation kinetics of high-k dielectric film deposition. This will be accomplished by identifying and testing potential precursor reactant sequences for the atomic layer deposition of various films.


An ultra-high vacuum reactor is being designed that will decouple mass transport from the surface reactions to facilitate an in-depth investigation of the surface kinetics. The reaction chamber will be equipped with in-situ Fourier Transform Infra Red (FTIR) and Temperature-Programmed Reaction Spectroscopy (TPRS) capabilities. To allow vacuum transfer of samples, the reactor will be clustered together with an existing integrated processing tool that contains two gas-phase cleaning reactor modules and a surface analysis chamber that is equipped with X-ray Photoelectron Spectroscopy (XPS) and Auger Spectroscopy.

Expected Results:

This research is expected to yield information about the reaction pathways, the effect of coverage on the kinetic parameters and the mechanism, and values for activation energies and pre-exponential factors.

Supplemental Keywords:

atomic layer deposition, ALD, high-k gate dielectric, precursor alternatives, environmentally conscious manufacturing, FTIR, TPRS, Auger, surface chemistry, nucleation kinetics, ultra-high vacuum, gas-phase cleaning, chemical engineering, semiconductor., Scientific Discipline, Air, Chemical Engineering, Environmental Chemistry, Analytical Chemistry, Engineering, Chemistry, & Physics, Environmental Engineering, Fourier Transform Infrared measurement, spectroscopic studies, spectroscopy, chemical kinetics, dielectric fil deposition, gas phase cleaning, fourier transform spectrometer (FTS), atomic layer deposition

Progress and Final Reports:

  • 2001
  • 2002
  • Final