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ENVIRONMENTAL TECHNOLOGY INITIATIVE: CHEMICAL-FREE CLEANING OF SEMICONDUCTORS BY THE RADIANCE PROCESS
Citation:
Legge, R. N., D. L. Thompson, D. J. Convey, AND J. D. Peterson. ENVIRONMENTAL TECHNOLOGY INITIATIVE: CHEMICAL-FREE CLEANING OF SEMICONDUCTORS BY THE RADIANCE PROCESS. U.S. Environmental Protection Agency, Washington, D.C., EPA/600/R-98/153 (NTIS PB99-126518), 1998.
Impact/Purpose:
information
Description:
The Radiance Process is a patented dry process for removing contaminants from surfaces. It uses light, usually from a pulsed laser and a gas inert to the surface, to entrain released contaminants. The focus of this effort is to assess the applicability of the Radiance Process to the semiconductor industry and its pollution prevention potential.
Record Details:
Record Type:DOCUMENT( PUBLISHED REPORT/ REPORT)
Product Published Date:12/31/1998
Record Last Revised:08/14/2008
OMB Category:Other
Record ID:
99191