Citation:

Ye, J., M. A. Matthews, AND C H. Darvin*. PREVENTION OF PHOTORESIST PATTERN COLLAPSE BY USING LIQUID CARBON DIOXIDE. INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH 40(24):5858-5860, (2001).

Description:

Photoresist polymers with small aspect ratios are presently cleaned with aqueous solutions. For small aspect ratios, the pattern collapses during the drying step. The origin of resist pattern collapse is the surface tension of the rinse liquid. Following a theoretic model, we present a preliminary analysis on using environmentally benign liquid carbon dioxide as a cleaning solvent. The use of carbon dioxide as a rinse liquid should prevent the resist pattern collapse problem.

Record Details:

Record Type:DOCUMENT( JOURNAL/ PEER REVIEWED JOURNAL)

Product Published Date:11/28/2001

Record Last Revised:12/22/2005

Record ID: 65456

Show Additional Record Data

Access Procedures :Industrial & Engineering Chemistry Research (journal) ISSN 0888-5885

Related Organizations:

Role :OWNER

Organization Name :US ENVIRONMENTAL PROTECTION AGENCY

Organization Name :OFFICE OF RESEARCH AND DEVELOPMENT

Organization Name :NATIONAL RISK MANAGEMENT RESEARCH LABORATORY

Organization Name :AIR POLLUTION PREVENTION AND CONTROL DIVISION

Document IDs:

EPA Number :EPA/600/J-02/021