||Reductive Dehalogenation: A Subsurface Bioremediation Process.
Sims, J. L.;
Suflita, J. M.;
Russell, H. H.;
||Robert S. Kerr Environmental Research Lab., Ada, OK. ;Utah Water Research Lab., Logan. ;Oklahoma Univ., Norman. Dept. of Botany and Microbiology.
Water pollution control;
Research and development;
Halogen organic compounds;
Oxidation reduction reactions;
Chemical reaction mechanisms
||Most EPA libraries have a fiche copy filed under the call number shown. Check with individual libraries about paper copy.
||Introduction and large-scale production of synthetic halogenated organic chemicals over the last fifty years has resulted in a group of contaminants that tend to persist in the environment and resist both biotic and abiotic degradation. The low solubility of these types of contaminants, along with their toxicity and tendency to accumulate in food chains, make them particularly relevant targets for remediation activities. Among the mechanisms that result in dehalogenation of some classes of organic contaminants are stimulation of metabolic sequences through introduction of electron donor and acceptor combinations; addition of nutrients to meet the needs of dehalogenating microorganisms; possible use of engineered microorganisms; and use of enzyme systems capable of catalyzing reductive dehalogenation. The current state of research and development in the area of reductive dehalogenation is discussed along with possible technological application of relevant processes and mechanisms to remediation of soil and groundwater contaminated with chlorinated organics. In addition, an overview of research needs is suggested, which might be of interest for development of in-situ systems to reduce the mass of halogenated organic contaminants in soil and groundwater.
||Pub. in Remediation, v1 n1 Winter 90/91. Prepared in cooperation with Utah Water Research Lab., Logan, and Oklahoma Univ., Norman. Dept. of Botany and Microbiology.
|NTIS Title Notes
||Reprint: Reductive Dehalogenation: A Subsurface Bioremediation Process.
||68D; 68; 57K; 99F
||PC A03/MF A01