Jump to main content or area navigation.

Contact Us

Extramural Research

Grantee Research Project Results

NCER Grantee Research Project Results

Publications Details for:

Removal of Photoresist and Post-Plasma Etch Sidewall Films Using Superciritical and Subcritical CO2 with Additives
Grant Number R829554
RFA: Technology for a Sustainable Environment (2001)


Other views: Selected publication types Journal articles Publications submitted after final report Redisplay this page with Reference Title, Journal, and Author Columns Display this page in RIS format

Book Chapter (1)
Journal Article (7)
Presentation (4)
Proceedings (2)
Reference Type Citation Progress Report Year Document Sources
Book Chapter Myneni S, Hess DW, Mendicino L. Fluorocarbon film and residue removal using supercrital CO2 mixtures.. The Electrochemical Scoiety, Pennington, NJ. 2002:180-189 R829554 (2002)
R829554 (Final)
not available
Journal Article Levitin G, Myneni S, Hess DW. Reactions between CO2 and tetramethylammonium hydroxide in cleaning solutions. Electrochemical and Solid State Letters 2003;6(8):G101-G104. R829554 (2002)
R829554 (2003)
R829554 (Final)
not available
Journal Article Levitin G, Bush D, Eckert CA, Hess DW. Phase behavior and modeling of CO2/methanol/tetramethylammonium bicarbonate and O2/methanol/tetramethylammonium bicarbonate/water mixtures at high pressures. Journal of Chemical Engineering & Data 2004;49(3):599-606. R829554 (2003)
R829554 (Final)
not available
Journal Article Levitin G, Myneni S, Hess DW. Post plasma etch residue removal using CO2-TMAHCO(3) mixtures: Comparison of single-phase and two-phase mixtures. Journal of the Electrochemical Society 2004;151(6):G380-G386 R829554 (2002)
R829554 (2003)
R829554 (Final)
not available
Journal Article Levitin G, Hess DW. Ionic conductivity of elevated pressure TMAHCO(3)/MeOH/CO2 mixtures. Electrochemical and Solid State Letters 2005;8(1):G23-G26 R829554 (Final)
not available
Journal Article Myneni S, Hess DW. Post-plasma-etch residue removal using CO2-based fluids. Journal of the Electrochemical Society 2003;150(12):G744-G750 R829554 (Final)
not available
Journal Article

Myneni S, Peng H-G, Gidley DW, Hess DW. Compatibility of High Pressure Cleaning Mixtures with a Porous Low Dielectric Constant Film: A positronium Annihilation Lifetime Spectroscopic Study. Journal of Vacuum Science and Technology B 2005;.23(4): 1463.

R829554 (Final)
not available
Journal Article Myneni S, Hess DW. Post plasma etch residue removal using CO2-based mixtures: Mechanistic considerations. Journal of the Electrochemical Society 2005;152(10) R829554 (Final)
not available
Presentation

Hess DW, Levitin G, Myneni S. Carbon dioxide based fluids for post plasma etch residue removal in integrated circuit (IC) fabrication. Presented at the Seventh Annual Green Chemistry and Engineering Conference, Washington, DC, June 23-26, 2003.

R829554 (Final)
not available
Presentation

Levitin G, Myneni S, Hess DW. Impact of phase behavior on photoresist removal using CO2 based mixtures. Presented at the Eighth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 204th Meeting of The Electrochemical Society, Orlando, FL, October 12-16, 2003.

R829554 (Final)
not available
Presentation

Levitin G, Myneni S, Hess DW. Super- and sub-critical CO2-based cleaning in BEOL processing: correlations between physical properties of cleaning mixtures and removal mechanism. Presented at the SEMATECH Cleaning Workshop, Austin, TX, May 7, 2004.

R829554 (Final)
not available
Presentation Myneni S, Hess DW. Fluorocarbon film and residue removal using supercritical CO2 mixtures. Presented at the 5th International Symposium on Environmental Issues with Materials and Processes for the Electronic and Semiconductors Industries, 201st Meeting of The Electrochemical Society, Philadelphia, PA, May 12-17, 2002. R829554 (2002)
not available
Proceedings Levitin G, Myneni S, Hess DW. Impact of phase behavior on photoresist removal using CO2 based mixtures. In: Ruzyllo J, Hattori T, Novak R, Opila R, eds. Cleaning Technology in Semiconductor Device Manufacturing, PV 2003-26, The Electrochemical Society Proceedings Series, Orlando, FL, October 12-17, 2003. R829554 (2003)
R829554 (Final)
not available
Proceedings

Myneni S, Hess DW. Fluorocarbon film and residue removal using supercritical CO2 mixtures. Proceedings - Electrochemical Society 2002;15:180-189.

R829554 (Final)
not available

Top of Page

The perspectives, information and conclusions conveyed in research project abstracts, progress reports, final reports, journal abstracts and journal publications convey the viewpoints of the principal investigator and may not represent the views and policies of ORD and EPA. Conclusions drawn by the principal investigators have not been reviewed by the Agency.

Jump to main content.