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Book and Book Chapter Publications Details for:

Removal of Photoresist and Post-Plasma Etch Sidewall Films Using Superciritical and Subcritical CO2 with Additives
Grant Number R829554
RFA: Technology for a Sustainable Environment (2001)

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Book Chapter (1)
Reference Type Citation Progress Report Year Document Sources
Book Chapter Myneni S, Hess DW, Mendicino L. Fluorocarbon film and residue removal using supercrital CO2 mixtures.. The Electrochemical Scoiety, Pennington, NJ. 2002:180-189 R829554 (2002)
R829554 (Final)
 not available

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